151-0621-00L  Microsystems I: Process Technology and Integration

SemesterAutumn Semester 2022
LecturersM. Haluska, C. Hierold
Periodicityyearly recurring course
Language of instructionEnglish



Courses

NumberTitleHoursLecturers
151-0621-00 VMicrosystems I: Process Technology and Integration
The lecture starts in the second week of the Semester.
3 hrs
Thu13:15-16:00HG E 5 »
C. Hierold, M. Haluska
151-0621-00 UMicrosystems I: Process Technology and Integration
The exercise starts in the third week of the Semester.
3 hrs
Tue16:15-19:00HG E 1.2 »
M. Haluska

Catalogue data

AbstractStudents are introduced to the fundamentals of semiconductors, the basics of micromachining and silicon process technology and will learn about the fabrication of microsystems and -devices by a sequence of defined processing steps (process flow).
ObjectiveStudents are introduced to the basics of micromachining and silicon process technology and will understand the fabrication of microsystem devices by the combination of unit process steps ( = process flow).
Content- Introduction to microsystems technology (MST) and micro electro mechanical systems (MEMS)
- Basic silicon technologies: Thermal oxidation, photolithography and etching, diffusion and ion implantation, thin film deposition.
- Specific microsystems technologies: Bulk and surface micromachining, dry and wet etching, isotropic and anisotropic etching, beam and membrane formation, wafer bonding, thin film mechanical properties.
Application of selected technologies will be demonstrated on case studies.
Lecture notesHandouts (available online)
Literature- S.M. Sze: Semiconductor Devices, Physics and Technology
- W. Menz, J. Mohr, O.Paul: Microsystem Technology
- Hong Xiao: Introduction to Semiconductor Manufacturing Technology
- M. J. Madou: Fundamentals of Microfabrication and Nanotechnology, 3rd ed.
- T. M. Adams, R. A. Layton: Introductory MEMS, Fabrication and Applications
Prerequisites / NoticePrerequisites: Physics I and II

Performance assessment

Performance assessment information (valid until the course unit is held again)
Performance assessment as a semester course
ECTS credits6 credits
ExaminersC. Hierold, M. Haluska
Typesession examination
Language of examinationEnglish
RepetitionThe performance assessment is offered every session. Repetition possible without re-enrolling for the course unit.
Mode of examinationoral 20 minutes
Additional information on mode of examinationStudents registered for Microsystems I: Process Technology and Integration (151-0621-00) (MS I) course can voluntary participate in an interim examination which would count only as a bonus to the final grade of the MSI oral examination. This interim exam is written and graded and will contain assignments/problems from the selected parts of MSI lectures and tutorials presented until the day of the examination. Obtaining 80-100% of points at the interim exam improves the student’s grade at the final oral exam by max. 0.25 grades. The maximum grade (6.0) can also be achieved exclusively by the oral exam performance itself without resorting to the bonus from the interim exam. The interim exam will take 1 hour. The date and time of the interim exam will be noticed to students by the lecturer. No auxiliary means are allowed. Any behavior during the exam which violates the ETH ethical codex will result in both the loss of bonus points but also the application of standard disciplinary measures.
This information can be updated until the beginning of the semester; information on the examination timetable is binding.

Learning materials

No public learning materials available.
Only public learning materials are listed.

Groups

No information on groups available.

Restrictions

There are no additional restrictions for the registration.

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