402-0318-00L  Semiconductor Materials: Characterization, Processing and Devices

SemesterSpring Semester 2021
LecturersS. Schön, W. Wegscheider
Periodicityyearly recurring course
Language of instructionEnglish

AbstractThis course gives an introduction into the fundamentals of semiconductor materials. The main focus in this semester is on state-of-the-art characterization, semiconductor processing and devices.
ObjectiveBasic knowledge of semiconductor physics and technology. Application of this knowledge for state-of-the-art semiconductor device processing
Content1. Material characterization: structural and chemical methods
1.1 X-ray diffraction methods (Powder diffraction, HRXRD, XRR, RSM)
1.2 Electron microscopy Methods (SEM, EDX, TEM, STEM, EELS)
2. Material characterization: electronic methods
2.1 van der Pauw techniquel2.2 Floating zone method
2.2 Hall effect
2.3 Cyclotron resonance spectroscopy
2.4. Quantum Hall effect
3. Material characterization: Optical methods
3.1 Absorption methods
3.2 Photoluminescence methods
3.3 FTIR, Raman spectroscopy
4. Semiconductor processing: lithography
4.1 Optical lithography methods
4.2 Electron beam lithography
4.3 FIB lithography
4.4 Scanning probe lithography
4.5 Direct growth methods (CEO, Nanowires)
5. Semiconductor processing: structuring of layers and devices
5.1 Wet etching methods
5.2 Dry etching methods (RIE, ICP, ion milling)
5.3 Physical vapor depositon methods (thermal, e-beam, sputtering)
5.4 Chemical vapor Deposition methods (PECVD, LPCVD, ALD)
5.5 Cleanroom basics & tour
6. Semiconductor devices
6.1 Semiconductor lasers
6.2 LED & detectors
6.3 Solar cells
6.4 Transistors (FET, HBT, HEMT)
Lecture notesLink
Prerequisites / NoticeThe "compulsory performance element" of this lecture is a short presentation of a research paper complementing the lecture topics. Several topics and corresponding papers will be offered on the moodle page of this lecture.