151-0620-00L Embedded MEMS Lab
| Semester | Frühjahrssemester 2021 |
| Dozierende | C. Hierold, M. Haluska |
| Periodizität | jedes Semester wiederkehrende Veranstaltung |
| Lehrsprache | Englisch |
| Kommentar | Number of participants limited to 20. |
Lehrveranstaltungen
| Nummer | Titel | Umfang | Dozierende | |||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| 151-0620-00 P | Embedded MEMS Lab - First part of the compulsory introductory lecture: Wed 24.02.2021 from 13h to 18h (venue: tbd) - Second part of the compulsory introductory lecture: Wed 03.03.2021 from 13h to 18h (venue: tbd) Practical portion of the course in the cleanrooms of FIRST-CLA consecutive Wednesdays from 13:00 (exact) to ~18:30 during the Semester. Starting days for groups are staggered. - Attendance is required at all meetings of the course. | 45s Std. |
| C. Hierold, M. Haluska |
Katalogdaten
| Kurzbeschreibung | Practical course: Students are introduced to the process steps required for the fabrication of MEMS (Micro Electro Mechanical System) and carry out the fabrication and testing steps in the clean rooms themselves. Additionally, they learn the requirements for working in clean rooms. Processing and characterization will be documented and analyzed in a final report. |
| Lernziel | Students learn the individual process steps that are required to make a MEMS (Micro Electro Mechanical System). Students carry out the process steps themselves in laboratories and clean rooms. Furthermore, participants become familiar with the special requirements (cleanliness, safety, operation of equipment and handling hazardous chemicals) of working in the clean rooms and laboratories. The entire production, processing, and characterization of the MEMS is documented and evaluated in a final report. |
| Inhalt | With guidance from a tutor, the individual silicon microsystem process steps that are required for the fabrication of an accelerometer are carried out: - Photolithography, dry etching, wet etching, sacrificial layer etching, various cleaning procedures - Packaging and electrical connection of a MEMS device - Testing and characterization of the MEMS device - Written documentation and evaluation of the entire production, processing and characterization |
| Skript | A document containing theory, background and practical course content is distributed in the informational meeting. |
| Literatur | The document provides sufficient information for the participants to successfully participate in the course. |
| Voraussetzungen / Besonderes | Participating students are required to attend all scheduled lectures and meetings of the course. Participating students are required to provide proof that they have personal accident insurance prior to the start of the laboratory portion of the course. This master's level course is limited to 20 students per semester for safety and efficiency reasons. If there are more than 20 students registered, we regret to restrict access to this course by the following rules: Priority 1: master students of the master's program in "Micro and Nanosystems" Priority 2: master students of the master's program in "Mechanical Engineering" with a specialization in Microsystems and Nanoscale Engineering (MAVT-tutors Profs Dual, Hierold, Koumoutsakos, Nelson, Norris, Poulikakos, Pratsinis, Stemmer), who attended the bachelor course "151-0621-00L Microsystems Technology" successfully. Priority 3: master students, who attended the bachelor course "151-0621-00L Microsystems Technology" successfully. Priority 4: all other students (PhD, bachelor, master) with a background in silicon or microsystems process technology. If there are more students in one of these priority groups than places available, we will decide with respect to (in following order) best achieved grade from 151-0621-00L Microsystems Technology, registration to this practicum at previous semester, and by drawing lots. Students will be notified at the first lecture of the course (introductory lecture) as to whether they are able to participate. The course is offered in autumn and spring semester. |
Leistungskontrolle
| Information zur Leistungskontrolle (gültig bis die Lerneinheit neu gelesen wird) | |
Leistungskontrolle als Semesterkurs | |
| ECTS Kreditpunkte | 5 KP |
| Prüfende | C. Hierold, M. Haluska |
| Form | benotete Semesterleistung |
| Prüfungssprache | Englisch |
| Repetition | Repetition nur nach erneuter Belegung der Lerneinheit möglich. |
Lernmaterialien
| Keine öffentlichen Lernmaterialien verfügbar. | |
| Es werden nur die öffentlichen Lernmaterialien aufgeführt. |
Gruppen
| Keine Informationen zu Gruppen vorhanden. |
Einschränkungen
| Keine zusätzlichen Belegungseinschränkungen vorhanden. |
