151-0621-00L Microsystems I: Process Technology and Integration
Semester | Autumn Semester 2017 |
Lecturers | M. Haluska, C. Hierold |
Periodicity | yearly recurring course |
Language of instruction | English |
Courses
Number | Title | Hours | Lecturers | ||||
---|---|---|---|---|---|---|---|
151-0621-00 V | Microsystems I: Process Technology and Integration The course starts in the second week of the semester. | 3 hrs |
| C. Hierold, M. Haluska | |||
151-0621-00 U | Microsystems I: Process Technology and Integration The course starts in the 3rd week of the Semester. | 3 hrs |
| M. Haluska |
Catalogue data
Abstract | Students are introduced to the fundamentals of semiconductors, the basics of micromachining and silicon process technology and will learn about the fabrication of microsystems and -devices by a sequence of defined processing steps (process flow). |
Objective | Students are introduced to the basics of micromachining and silicon process technology and will understand the fabrication of microsystem devices by the combination of unit process steps ( = process flow). |
Content | - Introduction to microsystems technology (MST) and micro electro mechanical systems (MEMS) - Basic silicon technologies: Thermal oxidation, photolithography and etching, diffusion and ion implantation, thin film deposition. - Specific microsystems technologies: Bulk and surface micromachining, dry and wet etching, isotropic and anisotropic etching, beam and membrane formation, wafer bonding, thin film mechanical properties. Application of selected technologies will be demonstrated on case studies. |
Lecture notes | Handouts (available online) |
Literature | - S.M. Sze: Semiconductor Devices, Physics and Technology - W. Menz, J. Mohr, O.Paul: Microsystem Technology - Hong Xiao: Introduction to Semiconductor Manufacturing Technology - M. J. Madou: Fundamentals of Microfabrication and Nanotechnology, 3rd ed. - T. M. Adams, R. A. Layton: Introductory MEMS, Fabrication and Applications |
Prerequisites / Notice | Prerequisites: Physics I and II |
Performance assessment
Performance assessment information (valid until the course unit is held again) | |
Performance assessment as a semester course | |
ECTS credits | 6 credits |
Examiners | C. Hierold, M. Haluska |
Type | session examination |
Language of examination | English |
Repetition | The performance assessment is offered every session. Repetition possible without re-enrolling for the course unit. |
Mode of examination | oral 20 minutes |
Additional information on mode of examination | Students registered for Microsystems I course can voluntary participate in a midterm exam which would count as a bonus to the final grade of the MST oral exam. This midterm exam is written and graded and will contain assignments/problems from the selected parts of MST lectures and tutorials presented until the day of the examination. Obtaining 90 - 100% of points at the midterm exam improves the student's grade at the final oral exam by max. 0.5 grades, while obtaining 75-90% of points improves the final oral exam grade by max. 0.25 grades. The maximum grade (6.0) can also be achieved exclusively by the oral exam performance itself without resorting to the bonus from the midterm exam. The midterm exam will take 1 hour. The date and time of the midterm exam will be noticed to students by the lecturer. No auxiliary means are allowed. Any behavior during the exam which violates the ETH ethical codex will result in both the loss of bonus points but also the application of standard disciplinary measures. |
This information can be updated until the beginning of the semester; information on the examination timetable is binding. |
Learning materials
Main link | Information |
Only public learning materials are listed. |
Groups
No information on groups available. |
Restrictions
There are no additional restrictions for the registration. |