Joakim Reuteler: Catalogue data in Autumn Semester 2020 |
Name | Dr. Joakim Reuteler |
Address | ScopeM ETH Zürich, HPM D 47 Otto-Stern-Weg 3 8093 Zürich SWITZERLAND |
Telephone | +41 44 633 69 91 |
joakim.reuteler@scopem.ethz.ch | |
URL | http://www.emez.ethz.ch/people/senresearchers/rjoakim |
Department | Materials |
Relationship | Lecturer |
Number | Title | ECTS | Hours | Lecturers | |
---|---|---|---|---|---|
327-0702-00L | EM-Practical Course in Materials Science | 2 credits | 4P | K. Kunze, S. Gerstl, F. Gramm, F. Krumeich, J. Reuteler | |
Abstract | Practical work on TEM, SEM, FIB and APT treatment of typical problems data analysis, writing of a report | ||||
Learning objective | Application of basic electron microscopic techniques to materials science problems | ||||
Literature | see lecture Electron Microscopy (327-0703-00L) | ||||
Prerequisites / Notice | Attendance of lecture Electron Microscopy (327-0703-00L) is recommended. Maximum number of participants 15, work in groups of 3 people. | ||||
327-2125-00L | Microscopy Training SEM I - Introduction to SEM The number of participants is limited. In case of overbooking, the course will be repeated once. All registrations will be recorded on the waiting list. For PhD students, postdocs and others, a fee will be charged (http://www.scopem.ethz.ch/education/MTP.html). All applicants must additionally register on this form: Link The selected applicants will be contacted and asked for confirmation a few weeks before the course date. | 2 credits | 3P | P. Zeng, A. G. Bittermann, S. Gerstl, L. Grafulha Morales, K. Kunze, J. Reuteler | |
Abstract | This introductory course on Scanning Electron Microscopy (SEM) emphasizes hands-on learning. Using ScopeM SEMs, students have the opportunity to study their own samples (or samples provided) and solve practical problems by applying knowledge acquired during the lectures. At the end of the course, students will be able to apply SEM for their (future) research projects. | ||||
Learning objective | - Set-up, align and operate a SEM successfully and safely. - Understand important operational parameters of SEM and optimize microscope performance. - Explain different signals in SEM and obtain secondary electron (SE) and backscatter electron (BSE) images. - Operate the SEM in low-vacuum mode. - Make use of EDX for semi-quantitative elemental analysis. - Prepare samples with different techniques and equipment for imaging and analysis by SEM. | ||||
Content | During the course, students learn through lectures, demonstrations, and hands-on sessions how to setup and operate SEM instruments, including low-vacuum and low-voltage applications. This course gives basic skills for students new to SEM. At the end of the course, students are able to align an SEM, to obtain secondary electron (SE) and backscatter electron (BSE) images and to perform energy dispersive X-ray spectroscopy (EDX) semi-quantitative analysis. Emphasis is put on procedures to optimize SEM parameters in order to best solve practical problems and deal with a wide range of materials. Lectures: - Introduction on Electron Microscopy and instrumentation - electron sources, electron lenses and probe formation - beam/specimen interaction, image formation, image contrast and imaging modes. - sample preparation techniques for EM - X-ray micro-analysis (theory and detection), qualitative and semi-quantitative EDX and point analysis, linescan and spectral mapping Practicals: - Brief description and demonstration of the SEM microscope - Practice on image formation, image contrast (and image processing) - Student participation on sample preparation techniques - Scanning Electron Microscopy lab exercises: setup and operate the instrument under various imaging modalities - Practice on real-world samples and report results | ||||
Lecture notes | Lecture notes will be distributed. | ||||
Literature | - Peter Goodhew, John Humphreys, Richard Beanland: Electron Microscopy and Analysis, 3rd ed., CRC Press, 2000 - Joseph Goldstein, et al, Scanning Electron Microscopy and X-Ray Microanalysis, 4th ed, Srpinger US, 2018 - Egerton: Physical Principles of Electron Microscopy: an introduction to TEM, SEM and AEM, Springer Verlag, 2007 | ||||
Prerequisites / Notice | No mandatory prerequisites. | ||||
327-2140-00L | Focused Ion Beam and Applications Number of participants limited to 6. PhD students will be asked for a fee. https://scopem.ethz.ch/education/MTP.html Registration form: (Link) | 1 credit | 2P | P. Zeng, A. G. Bittermann, S. Gerstl, L. Grafulha Morales, J. Reuteler | |
Abstract | The course on Focused Ion Beam (FIB) provides theoretical and hands-on learning, applying what is learned in lectures to hands-on sessions. | ||||
Learning objective | Overview of FIB theory, instrumentation. FIB hardware operation and applications. Set-up, align and operate a FIB-SEM successfully and safely. Accomplish operational tasks (milling and deposition) and optimize microscope parameters. Perform cross-sections: preparation and analysis Understanding of workflow for sample preparation (TEM lamella, APT needles, XCT pillars…) using FIB-SEM. Applying FIB-SEM for materials characterization. | ||||
Content | This course provides FIB techniques to students with previous SEM experience. At the end of the course, students will be able to set-up a FIB-SEM session and characterize cross-sections. Students will also understand how to prepare TEM & APT samples and design a FIB experiment to solve research problems. Introduction to FIB theory and instrumentation. Discussion of FIB operation and applications. Lecture and demonstration on FIB automation. Practicals on FIB-SEM set-up and alignment. Practicals on cross-section and site-specific sample characterization. Practicals on sample preparation (TEM lamella/APT needles). | ||||
Lecture notes | Lecture notes will be distributed. | ||||
Literature | Reyntjens, Steve & Puers, Robert. (2001). A review of focused ion beam applications in microsystem technology. J. Micromech. Microeng. J. Micromech. Microeng. 1157. 287-300. http://doi.org/10.1088/0960-1317/11/4/301. Yao, Nan ed.: Focused Ion Beam systems: Basics and Applications, Cambridge, 2007. | ||||
Prerequisites / Notice | The students should fulfil one or more of these prerequisites: Prior attendance to the ScopeM Microscopy Training SEM I: Introduction to SEM (327-2125-00L) Prior SEM experience. |