Silke Schön: Catalogue data in Spring Semester 2022

Name PD Dr. Silke Schön
Name variantsSilke Schön
S Schoen
S Schon
S Schön
FieldExperimental Physics
Address
FIRST-Lab
ETH Zürich, HCI D 121
Vladimir-Prelog-Weg 1-5/10
8093 Zürich
SWITZERLAND
Telephone+41 44 633 21 39
E-mailschoen@first.ethz.ch
DepartmentPhysics
RelationshipPrivatdozentin

NumberTitleECTSHoursLecturers
327-6101-00LFIRST Introduction Day Restricted registration - show details 0 credits1SS. Schön
AbstractThe FIRST Introduction Day comprises general and access information, cleanroom basics, infrastructure information, safety training, cleanliness seminar, chemistry seminar and safety test. The introduction day is mandatory for each user who intends to use the FIRST cleanrooms independently of level of experience.
ObjectiveAccess to the FIRST cleanroom.
ContentThe FIRST Introduction Day comprises general and access information, cleanroom basics, infrastructure information, safety training, cleanliness seminar, chemistry seminar and safety test. The introduction day is mandatory for each user who intends to use the FIRST cleanrooms independently of level of experience.
Lecture noteshttps://moodle-app2.let.ethz.ch/user/index.php?id=12731
402-0318-00LSemiconductor Materials: Characterization, Processing and Devices6 credits2V + 1US. Schön, M. Shayegan
AbstractThis course gives an introduction into the fundamentals of semiconductor materials. The main focus in this semester is on state-of-the-art characterization, semiconductor processing and devices.
ObjectiveBasic knowledge of semiconductor physics and technology. Application of this knowledge for state-of-the-art semiconductor device processing
Content1. Material characterization: structural and chemical methods
1.1 X-ray diffraction methods (Powder diffraction, HRXRD, XRR, RSM)
1.2 Electron microscopy Methods (SEM, EDX, TEM, STEM, EELS)
1.3 SIMS, RBS
2. Material characterization: electronic methods
2.1 van der Pauw techniquel2.2 Floating zone method
2.2 Hall effect
2.3 Cyclotron resonance spectroscopy
2.4. Quantum Hall effect
3. Material characterization: Optical methods
3.1 Absorption methods
3.2 Photoluminescence methods
3.3 FTIR, Raman spectroscopy
4. Semiconductor processing: lithography
4.1 Optical lithography methods
4.2 Electron beam lithography
4.3 FIB lithography
4.4 Scanning probe lithography
4.5 Direct growth methods (CEO, Nanowires)
5. Semiconductor processing: structuring of layers and devices
5.1 Wet etching methods
5.2 Dry etching methods (RIE, ICP, ion milling)
5.3 Physical vapor depositon methods (thermal, e-beam, sputtering)
5.4 Chemical vapor Deposition methods (PECVD, LPCVD, ALD)
5.5 Cleanroom basics & tour
6. Semiconductor devices
6.1 Semiconductor lasers
6.2 LED & detectors
6.3 Solar cells
6.4 Transistors (FET, HBT, HEMT)
Lecture noteshttps://moodle-app2.let.ethz.ch/course/view.php?id=16802
Prerequisites / NoticeThe "compulsory performance element" of this lecture is a short presentation of a research paper complementing the lecture topics. Several topics and corresponding papers will be offered on the moodle page of this lecture.