Silke Schön: Katalogdaten im Frühjahrssemester 2022

NameFrau PD Dr. Silke Schön
NamensvariantenSilke Schön
S Schoen
S Schon
S Schön
LehrgebietExperimentalphysik
Adresse
FIRST-Lab
ETH Zürich, HCI D 121
Vladimir-Prelog-Weg 1-5/10
8093 Zürich
SWITZERLAND
Telefon+41 44 633 21 39
E-Mailschoen@first.ethz.ch
DepartementPhysik
BeziehungPrivatdozentin

NummerTitelECTSUmfangDozierende
327-6101-00LFIRST Introduction Day Belegung eingeschränkt - Details anzeigen 0 KP1SS. Schön
KurzbeschreibungThe FIRST Introduction Day comprises general and access information, cleanroom basics, infrastructure information, safety training, cleanliness seminar, chemistry seminar and safety test. The introduction day is mandatory for each user who intends to use the FIRST cleanrooms independently of level of experience.
LernzielAccess to the FIRST cleanroom.
Skripthttps://moodle-app2.let.ethz.ch/user/index.php?id=12731
402-0318-00LSemiconductor Materials: Characterization, Processing and Devices6 KP2V + 1US. Schön, M. Shayegan
KurzbeschreibungThis course gives an introduction into the fundamentals of semiconductor materials. The main focus in this semester is on state-of-the-art characterization, semiconductor processing and devices.
LernzielBasic knowledge of semiconductor physics and technology. Application of this knowledge for state-of-the-art semiconductor device processing
Inhalt1. Material characterization: structural and chemical methods
1.1 X-ray diffraction methods (Powder diffraction, HRXRD, XRR, RSM)
1.2 Electron microscopy Methods (SEM, EDX, TEM, STEM, EELS)
1.3 SIMS, RBS
2. Material characterization: electronic methods
2.1 van der Pauw techniquel2.2 Floating zone method
2.2 Hall effect
2.3 Cyclotron resonance spectroscopy
2.4. Quantum Hall effect
3. Material characterization: Optical methods
3.1 Absorption methods
3.2 Photoluminescence methods
3.3 FTIR, Raman spectroscopy
4. Semiconductor processing: lithography
4.1 Optical lithography methods
4.2 Electron beam lithography
4.3 FIB lithography
4.4 Scanning probe lithography
4.5 Direct growth methods (CEO, Nanowires)
5. Semiconductor processing: structuring of layers and devices
5.1 Wet etching methods
5.2 Dry etching methods (RIE, ICP, ion milling)
5.3 Physical vapor depositon methods (thermal, e-beam, sputtering)
5.4 Chemical vapor Deposition methods (PECVD, LPCVD, ALD)
5.5 Cleanroom basics & tour
6. Semiconductor devices
6.1 Semiconductor lasers
6.2 LED & detectors
6.3 Solar cells
6.4 Transistors (FET, HBT, HEMT)
Skripthttps://moodle-app2.let.ethz.ch/course/view.php?id=16802
Voraussetzungen / BesonderesThe "compulsory performance element" of this lecture is a short presentation of a research paper complementing the lecture topics. Several topics and corresponding papers will be offered on the moodle page of this lecture.