Silke Schön: Katalogdaten im Frühjahrssemester 2022 |
Name | Frau PD Dr. Silke Schön |
Namensvarianten | Silke Schön S Schoen S Schon S Schön |
Lehrgebiet | Experimentalphysik |
Adresse | FIRST-Lab ETH Zürich, HCI D 121 Vladimir-Prelog-Weg 1-5/10 8093 Zürich SWITZERLAND |
Telefon | +41 44 633 21 39 |
schoen@first.ethz.ch | |
Departement | Physik |
Beziehung | Privatdozentin |
Nummer | Titel | ECTS | Umfang | Dozierende | |
---|---|---|---|---|---|
327-6101-00L | FIRST Introduction Day | 0 KP | 1S | S. Schön | |
Kurzbeschreibung | The FIRST Introduction Day comprises general and access information, cleanroom basics, infrastructure information, safety training, cleanliness seminar, chemistry seminar and safety test. The introduction day is mandatory for each user who intends to use the FIRST cleanrooms independently of level of experience. | ||||
Lernziel | Access to the FIRST cleanroom. | ||||
Skript | https://moodle-app2.let.ethz.ch/user/index.php?id=12731 | ||||
402-0318-00L | Semiconductor Materials: Characterization, Processing and Devices | 6 KP | 2V + 1U | S. Schön, M. Shayegan | |
Kurzbeschreibung | This course gives an introduction into the fundamentals of semiconductor materials. The main focus in this semester is on state-of-the-art characterization, semiconductor processing and devices. | ||||
Lernziel | Basic knowledge of semiconductor physics and technology. Application of this knowledge for state-of-the-art semiconductor device processing | ||||
Inhalt | 1. Material characterization: structural and chemical methods 1.1 X-ray diffraction methods (Powder diffraction, HRXRD, XRR, RSM) 1.2 Electron microscopy Methods (SEM, EDX, TEM, STEM, EELS) 1.3 SIMS, RBS 2. Material characterization: electronic methods 2.1 van der Pauw techniquel2.2 Floating zone method 2.2 Hall effect 2.3 Cyclotron resonance spectroscopy 2.4. Quantum Hall effect 3. Material characterization: Optical methods 3.1 Absorption methods 3.2 Photoluminescence methods 3.3 FTIR, Raman spectroscopy 4. Semiconductor processing: lithography 4.1 Optical lithography methods 4.2 Electron beam lithography 4.3 FIB lithography 4.4 Scanning probe lithography 4.5 Direct growth methods (CEO, Nanowires) 5. Semiconductor processing: structuring of layers and devices 5.1 Wet etching methods 5.2 Dry etching methods (RIE, ICP, ion milling) 5.3 Physical vapor depositon methods (thermal, e-beam, sputtering) 5.4 Chemical vapor Deposition methods (PECVD, LPCVD, ALD) 5.5 Cleanroom basics & tour 6. Semiconductor devices 6.1 Semiconductor lasers 6.2 LED & detectors 6.3 Solar cells 6.4 Transistors (FET, HBT, HEMT) | ||||
Skript | https://moodle-app2.let.ethz.ch/course/view.php?id=16802 | ||||
Voraussetzungen / Besonderes | The "compulsory performance element" of this lecture is a short presentation of a research paper complementing the lecture topics. Several topics and corresponding papers will be offered on the moodle page of this lecture. |