Christof Schneider: Katalogdaten im Frühjahrssemester 2023

NameHerr PD Dr. Christof Schneider
LehrgebietExperimentalphysik
Adresse
Paul Scherrer Institut (PSI)
OFLB/U111
5232 Villigen PSI
SWITZERLAND
Telefon056 310 41 22
E-Mailschristo@ethz.ch
URLhttps://www.psi.ch/en/lmx-interfaces/people/christof-schneider
DepartementPhysik
BeziehungPrivatdozent

NummerTitelECTSUmfangDozierende
327-2104-00LInorganic Thin Films: Processing, Properties and Applications2 KP2GC. Schneider, T. Lippert
KurzbeschreibungIntroduction to thin films growth and properties. The nucleation and growth of thin film theory is presented and the obtainable microstructures are illustrated. Main processing and characterization techniques will be discussed.
LernzielAchieve an understanding of major film growth methods, the most important growth mechanisms and characterization techniques.
To obtain a basic knowledge of specific thin film properties and selected applications.
InhaltThis course gives an introduction to the topic of thin films growth with an emphasis on oxides, respectively oxide thin films. The main deposition techniques available for oxide thin film growth are physical and chemical vapor deposition techniques (PVD and CVD) as well as so called “wet techniques” (e.g. spin coating and spray pyrolysis). A special emphasis will be given to techniques which are important for industrial applications and basic research. A part of the course discusses vacuum technologies, materials selection and preparation.
The second main topic is thin film characterization which includes structural, chemical, mechanical, magnetic and electrical properties as well as the quantitative analysis of thin film composition. Finally, microfabrication and packaging are a topic of great technological importance and the basis for industrial applications.


I Table of Content

1 Introduction

2 Thin Film Fundamentals
2.1 Thin Film Formation
2.2 Thin Film Microstructure
2.3 Grain Growth
2.4 Epitaxy and Texture

3 Deposition Techniques
3.1 Non-Vacuum Deposition Techniques
3.1.1 Spray Pyrolysis
3.1.2 Sol Gel Deposition
3.2 Vacuum Deposition Techniques
3.2.1 Introduction to Vacuum
3.2.2 Thermal Evaporation and Molecular Beam Epitaxy (MBE)
3.2.3 Sputtering
3.2.4 Pulsed Laser Deposition (PLD)
3.2.5 Chemical Vapor Deposition

4 Properties and Characterization
4.1 Surface and Mechanical Properties
4.2 Thermal Properties
4.3 Structural Properties
4.4 Compositional Analysis
4.5 Chemical Properties
4.6 Electrical and Magnetic Properties
4.7 Optical Properties

5 Industrial Applications
SkriptLecture notes will be provided.
LiteraturM. Ohring, “Materials science of thin films”, Academic Press
A. Elshabini-Riad, F.D. Barlow, “Thin film technology handbook”, Mc Graw Hill
Nucleation and growth of thin films, J A Venables, G D T Spiller and M Hanbucken, Rep. Prog. Phys., Vol 47, pp 399-459, 1984