Werner Wegscheider: Catalogue data in Spring Semester 2019

Name Prof. Dr. Werner Wegscheider
FieldSold State Physics
Address
Laboratorium für Festkörperphysik
ETH Zürich, HPF E 7
Otto-Stern-Weg 1
8093 Zürich
SWITZERLAND
Telephone+41 44 633 77 40
E-mailwerner.wegscheider@phys.ethz.ch
URLhttps://mbe.ethz.ch
DepartmentPhysics
RelationshipFull Professor

NumberTitleECTSHoursLecturers
402-0034-10LPhysics II4 credits2V + 2UW. Wegscheider
AbstractThis is a two-semester course introducing students into the foundations of Modern Physics. Topics include electricity and magnetism, light, waves, quantum physics, solid state physics, and semiconductors. Selected topics with important applications in industry will also be considered.
ObjectiveThe lecture is intended to promote critical, scientific thinking. Key concepts of Physics will be acquired, with a focus on technically relevant applications. At the end of the two semesters, students will have a good overview over the topics of classical and modern Physics.
ContentIntroduction into Quantum Physics, Absorption and Emission of Electromagnetic Radiation, Basics of Solid State Physics, Semiconductors
Lecture notesLecture notes will be available in German.
LiteraturePaul A. Tipler, Gene Mosca, Michael Basler und Renate Dohmen
Physik: für Wissenschaftler und Ingenieure
Spektrum Akademischer Verlag, 2009, 1636 Seiten, ca. 80 Euro.

Paul A. Tipler, Ralph A. Llewellyn
Moderne Physik
Oldenbourg Wissenschaftsverlag, 2009, 982 Seiten, ca. 75 Euro.
Prerequisites / NoticeNo testat requirements for this lecture.
402-0318-00LSemiconductor Materials: Characterization, Processing and Devices6 credits2V + 1US. Schön, W. Wegscheider
AbstractThis course gives an introduction into the fundamentals of semiconductor materials. The main focus in this semester is on state-of-the-art characterization, semiconductor processing and devices.
ObjectiveBasic knowledge of semiconductor physics and technology. Application of this knowledge for state-of-the-art semiconductor device processing
Content1. Material characterization: structural and chemical methods
1.1 X-ray diffraction methods (Powder diffraction, HRXRD, XRR, RSM)
1.2 Electron microscopy Methods (SEM, EDX, TEM, STEM, EELS)
1.3 SIMS, RBS
2. Material characterization: electronic methods
2.1 van der Pauw techniquel2.2 Floating zone method
2.2 Hall effect
2.3 Cyclotron resonance spectroscopy
2.4. Quantum Hall effect
3. Material characterization: Optical methods
3.1 Absorption methods
3.2 Photoluminescence methods
3.3 FTIR, Raman spectroscopy
4. Semiconductor processing: lithography
4.1 Optical lithography methods
4.2 Electron beam lithography
4.3 FIB lithography
4.4 Scanning probe lithography
4.5 Direct growth methods (CEO, Nanowires)
5. Semiconductor processing: structuring of layers and devices
5.1 Wet etching methods
5.2 Dry etching methods (RIE, ICP, ion milling)
5.3 Physical vapor depositon methods (thermal, e-beam, sputtering)
5.4 Chemical vapor Deposition methods (PECVD, LPCVD, ALD)
5.5 Cleanroom basics & tour
6. Semiconductor devices
6.1 Semiconductor lasers
6.2 LED & detectors
6.3 Solar cells
6.4 Transistors (FET, HBT, HEMT)
Lecture noteshttps://moodle-app2.let.ethz.ch/course/view.php?id=10464
Prerequisites / NoticeThe "compulsory performance element" of this lecture is a short presentation of a research paper complementing the lecture topics. Several topics and corresponding papers will be offered on the moodle page of this lecture.