Search result: Catalogue data in Autumn Semester 2016
Physics Master ![]() | ||||||
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![]() ![]() Students may choose General Electives from the entire course programme of ETH Zurich - with the following restrictions: courses that belong to the first or second year of a Bachelor curriculum at ETH Zurich as well as courses from GESS "Science in Perspective" are not eligible here. The following courses are explicitly recommended to physics students by their lecturers. (Courses in this list may be assigned to the category "General Electives" directly in myStudies. For the category assignment of other eligible courses keep the choice "no category" and take contact with the Study Administration (www.phys.ethz.ch/studies/study-administration.html) after having received the credits.) | ||||||
Number | Title | Type | ECTS | Hours | Lecturers | |
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227-0965-00L | Micro and Nano-Tomography of Biological Tissues | W | 4 credits | 3G | M. Stampanoni, P. A. Kaestner | |
Abstract | The lecture introduces the physical and technical know-how of X-ray tomographic microscopy. Several X-ray imaging techniques (absorption-, phase- and darkfield contrast) will be discussed and their use in daily research, in particular biology, is presented. The course discusses the aspects of quantitative evaluation of tomographic data sets like segmentation, morphometry and statistics. | |||||
Objective | Introduction to the basic concepts of X-ray tomographic imaging, image analysis and data quantification at the micro and nano scale with particular emphasis on biological applications | |||||
Content | Synchrotron-based X-ray micro- and nano-tomography is today a powerful technique for non-destructive, high-resolution investigations of a broad range of materials. The high-brilliance and high-coherence of third generation synchrotron radiation facilities allow quantitative, three-dimensional imaging at the micro and nanometer scale and extend the traditional absorption imaging technique to edge-enhanced and phase-sensitive measurements, which are particularly suited for investigating biological samples. The lecture includes a general introduction to the principles of tomographic imaging from image formation to image reconstruction. It provides the physical and engineering basics to understand how imaging beamlines at synchrotron facilities work, looks into the recently developed phase contrast methods, and explores the first applications of X-ray nano-tomographic experiments. The course finally provides the necessary background to understand the quantitative evaluation of tomographic data, from basic image analysis to complex morphometrical computations and 3D visualization, keeping the focus on biomedical applications. | |||||
Lecture notes | Available online | |||||
Literature | Will be indicated during the lecture. | |||||
227-0157-00L | Semiconductor Devices: Physical Bases and Simulation | W | 4 credits | 3G | A. Schenk | |
Abstract | The course addresses the physical principles of modern semiconductor devices and the foundations of their modeling and numerical simulation. Necessary basic knowledge on quantum-mechanics, semiconductor physics and device physics is provided. Computer simulations of the most important devices and of interesting physical effects supplement the lectures. | |||||
Objective | The course aims at the understanding of the principle physics of modern semiconductor devices, of the foundations in the physical modeling of transport and its numerical simulation. During the course also basic knowledge on quantum-mechanics, semiconductor physics and device physics is provided. | |||||
Content | The main topics are: transport models for semiconductor devices (quantum transport, Boltzmann equation, drift-diffusion model, hydrodynamic model), physical characterization of silicon (intrinsic properties, scattering processes), mobility of cold and hot carriers, recombination (Shockley-Read-Hall statistics, Auger recombination), impact ionization, metal-semiconductor contact, metal-insulator-semiconductor structure, and heterojunctions. The exercises are focussed on the theory and the basic understanding of the operation of special devices, as single-electron transistor, resonant tunneling diode, pn-diode, bipolar transistor, MOSFET, and laser. Numerical simulations of such devices are performed with an advanced simulation package (Sentaurus-Synopsys). This enables to understand the physical effects by means of computer experiments. | |||||
Lecture notes | The script (in book style) can be downloaded from: http://www.iis.ee.ethz.ch/˜schenk/vorlesung. | |||||
Literature | The script (in book style) is sufficient. Further reading will be recommended in the lecture. | |||||
Prerequisites / Notice | Qualifications: Physics I+II, Semiconductor devices (4. semester). | |||||
227-0147-00L | VLSI II: Design of Very Large Scale Integration Circuits | W | 7 credits | 5G | H. Kaeslin, F. K. Gürkaynak, M. Korb | |
Abstract | This second course in our VLSI series is concerned with how to turn digital circuit netlists into safe, testable and manufacturable mask layout, taking into account various parasitic effects. Low-power circuit design is another important topic. Economic aspects and management issues of VLSI projects round off the course. | |||||
Objective | Know how to design digital VLSI circuits that are safe, testable, durable, and make economic sense. | |||||
Content | The second course begins with a thorough discussion of various technical aspects at the circuit and layout level before moving on to economic issues of VLSI. Topics include: - The difficulties of finding fabrication defects in large VLSI chips. - How to make integrated circuit testable (design for test). - Synchronous clocking disciplines compared, clock skew, clock distribution, input/output timing. - Synchronization and metastability. - CMOS transistor-level circuits of gates, flip-flops and random access memories. - Sinks of energy in CMOS circuits. - Power estimation and low-power design. - Current research in low-energy computing. - Layout parasitics, interconnect delay, static timing analysis. - Switching currents, ground bounce, IR-drop, power distribution. - Floorplanning, chip assembly, packaging. - Layout design at the mask level, physical design verification. - Electromigration, electrostatic discharge, and latch-up. - Models of industrial cooperation in microelectronics. - The caveats of virtual components. - The cost structures of ASIC development and manufacturing. - Market requirements, decision criteria, and case studies. - Yield models. - Avenues to low-volume fabrication. - Marketing considerations and case studies. - Management of VLSI projects. Exercises are concerned with back-end design (floorplanning, placement, routing, clock and power distribution, layout verification). Industrial CAD tools are being used. | |||||
Lecture notes | H. Kaeslin: "Top-Down Digital VLSI Design, from Gate-Level Circuits to CMOS Fabrication", Lecture Notes Vol.2 , 2015. All written documents in English. | |||||
Literature | H. Kaeslin: "Top-Down Digital VLSI Design, from Architectures to Gate-Level Circuits and FPGAs", Elsevier, 2014, ISBN 9780128007303. | |||||
Prerequisites / Notice | Highlight: Students are offered the opportunity to design a circuit of their own which then gets actually fabricated as a microchip! Students who elect to participate in this program register for a term project at the Integrated Systems Laboratory in parallel to attending the VLSI II course. Prerequisites: "VLSI I: from Architectures to Very Large Scale Integration Circuits and FPGAs" or equivalent knowledge. Further details: http://www.iis.ee.ethz.ch/stud_area/vorlesungen/vlsi2.en.html | |||||
227-0663-00L | Nano-Optics ![]() | W | 6 credits | 2V + 2U | L. Novotny | |
Abstract | Nano-Optics is the study of optical phenomena and techniques on the nanometer scale. It is an emerging field of study motivated by the rapid advance of nanoscience and technology. It embraces topics such as plasmonics, optical antennas, optical trapping and manipulation, and high-resolution imaging and spectroscopy. | |||||
Objective | Understanding concepts of light localization and light-matter interactions on the nanoscale. | |||||
Content | Starting with an angular spectrum representation of optical fields the role of inhomogeneous evanescent fields is discussed. Among the topics are: theory of strongly focused light, point spread functions, resolution criteria, confocal microscopy, and near-field optical microscopy. Further topics are: optical interactions between nanoparticles, atomic decay rates in inhomogeneous environments, single molecule spectroscopy, light forces and optical trapping, photonic bandgap materials, and theoretical methods in nano-optics. | |||||
Prerequisites / Notice | - Electrodynamics (or equivalent) - Physics I+II | |||||
227-0301-00L | Optical Communication Fundamentals | W | 6 credits | 2V + 1U + 1P | J. Leuthold | |
Abstract | The path of an analog signal in the transmitter to the digital world in a communication link and back to the analog world at the receiver is discussed. The lecture covers the fundamentals of all important optical and optoelectronic components in a fiber communication system. This includes the transmitter, the fiber channel and the receiver with the electronic digital signal processing elements. | |||||
Objective | An in-depth understanding on how information is transmitted from source to destination. Also the mathematical framework to describe the important elements will be passed on. Students attending the lecture will further get engaged in critical discussion on societal, economical and environmental aspects related to the on-going exponential growth in the field of communications. | |||||
Content | * Chapter 1: Introduction: Analog/Digital conversion, The communication channel, Shannon channel capacity, Capacity requirements. * Chapter 2: The Transmitter: Components of a transmitter, Lasers, The spectrum of a signal, Optical modulators, Modulation formats. * Chapter 3: The Optical Fiber Channel: Geometrical optics, The wave equations in a fiber, Fiber modes, Fiber propagation, Fiber losses, Nonlinear effects in a fiber. * Chapter 4: The Receiver: Photodiodes, Receiver noise, Detector schemes (direct detection, coherent detection), Bit-error ratios and error estimations. * Chapter 5: Digital Signal Processing Techniques: Digital signal processing in a coherent receiver, Error detection teqchniques, Error correction coding. * Chapter 6: Pulse Shaping and Multiplexing Techniques: WDM/FDM, TDM, OFDM, Nyquist Multiplexing, OCDMA. * Chapter 7: Optical Amplifiers : Semiconductor Optical Amplifiers, Erbium Doped Fiber Amplifiers, Raman Amplifiers. | |||||
Lecture notes | Lecture notes are handed out. | |||||
Literature | Govind P. Agrawal; "Fiber-Optic Communication Systems"; Wiley, 2010 | |||||
Prerequisites / Notice | Fundamentals of Electromagnetic Fields & Bachelor Lectures on Physics. | |||||
151-0620-00L | Embedded MEMS Lab ![]() | W | 5 credits | 3P | C. Hierold, S. Blunier, M. Haluska | |
Abstract | Practical course: Students are introduced to the process steps required for the fabrication of MEMS (Micro Electro Mechanical System) and carry out the fabrication and testing steps in the clean rooms by themselves. Additionally, they learn the requirements for working in clean rooms. Processing and characterization will be documented and analyzed in a final report. Limited access | |||||
Objective | Students learn the individual process steps that are required to make a MEMS (Micro Electro Mechanical System). Students carry out the process steps themselves in laboratories and clean rooms. Furthermore, participants become familiar with the special requirements (cleanliness, safety, operation of equipment and handling hazardous chemicals) of working in the clean rooms and laboratories. The entire production, processing, and characterization of the MEMS is documented and evaluated in a final report. | |||||
Content | With guidance from a tutor, the individual silicon microsystem process steps that are required for the fabrication of an accelerometer are carried out: - Photolithography, dry etching, wet etching, sacrificial layer etching, critical point drying, various cleaning procedures - Packaging and electrical connection of a MEMS device - Testing and characterization of the MEMS device - Written documentation and evaluation of the entire production, processing and characterization | |||||
Lecture notes | A document containing theory, background and practical course content is distributed at the first meeting of the course. | |||||
Literature | The document provides sufficient information for the participants to successfully participate in the course. | |||||
Prerequisites / Notice | Participating students are required to attend all scheduled lectures and meetings of the course. Participating students are required to provide proof that they have personal accident insurance prior to the start of the laboratory portion of the course. This master's level course is limited to 15 students per semester for safety and efficiency reasons. If there are more than 15 students registered, we regret to restrict access to this course by the following rules: Priority 1: master students of the master's program in "Micro and Nanosystems" Priority 2: master students of the master's program in "Mechanical Engineering" with a specialization in Microsystems and Nanoscale Engineering (MAVT-tutors Profs Daraio, Dual, Hierold, Koumoutsakos, Nelson, Norris, Park, Poulikakos, Pratsinis, Stemmer), who attended the bachelor course "151-0621-00L Microsystems Technology" successfully. Priority 3: master students, who attended the bachelor course "151-0621-00L Microsystems Technology" successfully. Priority 4: all other students (PhD, bachelor, master) with a background in silicon or microsystems process technology. If there are more students in one of these priority groups than places available, we will decide by drawing lots. Students will be notified at the first lecture of the course (introductory lecture) as to whether they are able to participate. The course is offered in autumn and spring semester. | |||||
529-0443-00L | Advanced Magnetic Resonance | W | 7 credits | 3G | B. H. Meier, M. Ernst | |
Abstract | The course is for advanced students and covers selected topics from magnetic resonance spectroscopy. This year, the lecture will introduce and discuss relaxation theory and its applications in magnetic resonance. | |||||
Objective | The aim of the course is to familiarize the students with the basic concepts of magnetic resonance relaxation theory in liquids and solids. Starting from the mathematical description of spin dynamics, the effect of stochastic motional processes on the density operator will be analyzed. In the end students should understand the Redfield formulation of relaxation and be able to understand the effect of dynamics on magnetic resonance experiments. | |||||
Content | The aim of the course is to familiarize the students with the basic concepts of magnetic resonance relaxation theory in liquids and solids. Starting from the mathematical description of spin dynamics, the effect of stochastic motional processes on the density operator will be analyzed. In the end students should understand the Redfield formulation of relaxation and be able to understand the effect of dynamics on magnetic resonance experiments. | |||||
Lecture notes | A script which covers the topics will be distributed in the lecture and will be accessible through the web page http://www.ssnmr.ethz.ch/education/ | |||||
327-0703-00L | Electron Microscopy in Material Science | W | 4 credits | 2V + 2U | K. Kunze, R. Erni, S. Gerstl, F. Gramm, F. Krumeich | |
Abstract | A comprehensive understanding of the interaction of electrons with condensed matter and details on the instrumentation and methods designed to use these probes in the structural and chemical analysis of various materials. | |||||
Objective | A comprehensive understanding of the interaction of electrons with condensed matter and details on the instrumentation and methods designed to use these probes in the structural and chemical analysis of various materials. | |||||
Content | This course provides a general introduction into electron microscopy of organic and inorganic materials. In the first part, the basics of transmission- and scanning electron microscopy are presented. The second part includes the most important aspects of specimen preparation, imaging and image processing. In the third part, recent applications in materials science, solid state physics, structural biology, structural geology and structural chemistry will be reported. | |||||
Lecture notes | Englisch | |||||
Literature | Transmission Electron Microscopy, L. Reimer; Einführung in die Elektronenmikroskopie, M. v. Heimendahl. Williams, Carter: Transmission Electron Microscopy, Plenum Press, 1996. Hawkes, Valdrè: Biophysical Electron Microscopy, Academic Press, 1990. Frank: Electron Tomography, Plenum Press, 1992. Erni: Aberration-corrected imaging in transmission electron microscopy, Imperial College Press (2010, and 2nd ed. 2015) | |||||
327-0702-00L | EM-Practical Course in Materials Science | W | 2 credits | 4P | K. Kunze, F. Gramm, F. Krumeich, J. Reuteler | |
Abstract | Practical work on a TEM and on SEM, treatment of typical problems, data analysis, writing of a report | |||||
Objective | Application of basic electron microscopic techniques to materials science problems | |||||
Literature | see lecture Electron Microscopy (327-0703-00L) | |||||
Prerequisites / Notice | Prerequisite: the lecture Electron Microscopy (327-0703-00L) has to be attended with success, maximum number of participants 15, work in groups of 3 people. | |||||
327-2125-00L | Microscopy Training SEM I - Introduction to SEM ![]() Number of participants limited to 6. The participants will be chosen based on a short motivation letter. Please send this letter to S. Rodighiero (main lecturer) as soon as possible. | W | 1 credit | 3P | S. Rodighiero, A. G. Bittermann, K. Kunze, J. Reuteler | |
Abstract | The introductory course on Scanning Electron Microscopy (SEM) emphasizes hands-on learning. Using 2 SEM instruments, students have the opportunity to study their own samples, or standard test samples, as well as solving exercises provided by ScopeM scientists. | |||||
Objective | - Set-up, align and operate a SEM successfully and safely. - Accomplish imaging tasks successfully and optimize microscope performances. - Master the operation of a low-vacuum and field-emission SEM and EDX instrument. - Perform sample preparation with corresponding techniques and equipment for imaging and analysis - Acquire techniques in obtaining secondary electron and backscatter electron micrographs - Perform EDX qualitative and semi-quantitative analysis | |||||
Content | During the course, students learn through lectures, demonstrations, and hands-on sessions how to setup and operate SEM instruments, including low-vacuum and low-voltage applications. This course gives basic skills for students new to SEM. At the end of the course, students with no prior experience are able to align a SEM, to obtain secondary electron (SE) and backscatter electron (BSE) micrographs and to perform energy dispersive X-ray spectroscopy (EDX) qualitative and semi-quantitative analysis. The procedures to better utilize SEM to solve practical problems and to optimize SEM analysis for a wide range of materials will be emphasized. - Discussion of students' sample/interest - Introduction and discussion on Electron Microscopy and instrumentation - Lectures on electron sources, electron lenses and probe formation - Lectures on beam/specimen interaction, image formation, image contrast and imaging modes. - Lectures on sample preparation techniques for EM - Brief description and demonstration of the SEM microscope - Practice on beam/specimen interaction, image formation, image contrast (and image processing) - Student participation on sample preparation techniques - Scanning Electron Microscopy lab exercises: setup and operate the instrument under various imaging modalities - Lecture and demonstrations on X-ray micro-analysis (theory and detection), qualitative and semi-quantitative EDX and point analysis, linescans and spectral mapping - Practice on real-world samples and report results | |||||
Literature | - Detailed course manual - Williams, Carter: Transmission Electron Microscopy, Plenum Press, 1996 - Hawkes, Valdre: Biophysical Electron Microscopy, Academic Press, 1990 - Egerton: Physical Principles of Electron Microscopy: an introduction to TEM, SEM and AEM, Springer Verlag, 2007 | |||||
Prerequisites / Notice | No mandatory prerequisites. Please consider the prior attendance to EM Basic lectures (551- 1618-00V; 227-0390-00L; 327-0703-00L) as suggested prerequisite. | |||||
327-2126-00L | Microscopy Training TEM I - Introduction to TEM ![]() Does not take place this semester. Number of participants limited to 6. The participants will be chosen based on a short motivation letter. Please send this letter to S. Rodighiero (main lecturer). | W | 1 credit | 3P | ||
Abstract | The introductory course on Transmission Electron Microscopy (TEM) provides theoretical and hands-on learning for new operators, utilizing lectures, demonstrations, and hands-on sessions. | |||||
Objective | - Overview of TEM theory, instrumentation, operation and applications. - Alignment and operation of a TEM, as well as acquisition and interpretation of images, diffraction patterns, accomplishing basic tasks successfully. - Knowledge of electron imaging modes (including Scanning Transmission Electron Microscopy), magnification calibration, and image acquisition using CCD cameras. - To set up the TEM to acquire diffraction patterns, perform camera length calibration, as well as measure and interpret diffraction patterns. - Overview of techniques for specimen preparation. | |||||
Content | Using two Transmission Electron Microscopes the students learn how to align a TEM, select parameters for acquisition of images in bright field (BF) and dark field (DF), perform scanning transmission electron microscopy (STEM) imaging, phase contrast imaging, and acquire electron diffraction patterns. The participants will also learn basic and advanced use of digital cameras and digital imaging methods. - Introduction and discussion on Electron Microscopy and instrumentation. - Lectures on electron sources, electron lenses and probe formation. - Lectures on beam/specimen interaction, image formation, image contrast and imaging modes. - Lectures on sample preparation techniques for EM. - Brief description and demonstration of the TEM microscope. - Practice on beam/specimen interaction, image formation, Image contrast (and image processing). - Demonstration of Transmission Electron Microscopes and imaging modes (Phase contrast, BF, DF, STEM). - Student participation on sample preparation techniques. - Transmission Electron Microscopy lab exercises: setup and operate the instrument under various imaging modalities. - TEM alignment, calibration, correction to improve image contrast and quality. - Electron diffraction. - Practice on real-world samples and report results. | |||||
Literature | - Detailed course manual - Williams, Carter: Transmission Electron Microscopy, Plenum Press, 1996 - Hawkes, Valdre: Biophysical Electron Microscopy, Academic Press, 1990 - Egerton: Physical Principles of Electron Microscopy: an introduction to TEM, SEM and AEM, Springer Verlag, 2007 | |||||
Prerequisites / Notice | No mandatory prerequisites. Please consider the prior attendance to EM Basic lectures (551- 1618-00V; 227-0390-00L; 327-0703-00L) as suggested prerequisite. | |||||
363-0541-00L | Systems Dynamics and Complexity | W | 3 credits | 3G | F. Schweitzer, G. Casiraghi, V. Nanumyan | |
Abstract | Finding solutions: what is complexity, problem solving cycle. Implementing solutions: project management, critical path method, quality control feedback loop. Controlling solutions: Vensim software, feedback cycles, control parameters, instabilities, chaos, oscillations and cycles, supply and demand, production functions, investment and consumption | |||||
Objective | A successful participant of the course is able to: - understand why most real problems are not simple, but require solution methods that go beyond algorithmic and mathematical approaches - apply the problem solving cycle as a systematic approach to identify problems and their solutions - calculate project schedules according to the critical path method - setup and run systems dynamics models by means of the Vensim software - identify feedback cycles and reasons for unintended systems behavior - analyse the stability of nonlinear dynamical systems and apply this to macroeconomic dynamics | |||||
Content | Why are problems not simple? Why do some systems behave in an unintended way? How can we model and control their dynamics? The course provides answers to these questions by using a broad range of methods encompassing systems oriented management, classical systems dynamics, nonlinear dynamics and macroeconomic modeling. The course is structured along three main tasks: 1. Finding solutions 2. Implementing solutions 3. Controlling solutions PART 1 introduces complexity as a system immanent property that cannot be simplified. It introduces the problem solving cycle, used in systems oriented management, as an approach to structure problems and to find solutions. PART 2 discusses selected problems of project management when implementing solutions. Methods for identifying the critical path of subtasks in a project and for calculating the allocation of resources are provided. The role of quality control as an additional feedback loop and the consequences of small changes are discussed. PART 3, by far the largest part of the course, provides more insight into the dynamics of existing systems. Examples come from biology (population dynamics), management (inventory modeling, technology adoption, production systems) and economics (supply and demand, investment and consumption). For systems dynamics models, the software program VENSIM is used to evaluate the dynamics. For economic models analytical approaches, also used in nonlinear dynamics and control theory, are applied. These together provide a systematic understanding of the role of feedback loops and instabilities in the dynamics of systems. Emphasis is on oscillating phenomena, such as business cycles and other life cycles. Weekly self-study tasks are used to apply the concepts introduced in the lectures and to come to grips with the software program VENSIM. | |||||
Lecture notes | The lecture slides are provided as handouts - including notes and literature sources - to registered students only. All material is to be found on the Moodle platform. More details during the first lecture | |||||
Prerequisites / Notice | Self-study tasks (discussion exercises, Vensim exercises) are provided as home work. Weekly exercise sessions (45 min) are used to discuss selected solutions. Regular participation in the exercises is an efficient way to understand the concepts relevant for the final exam. | |||||
363-1065-00L | Design Thinking: Human-Centred Solutions to Real World Challenges ![]() Due to didactic reasons, the number of participants is limited to 30. All interested students are invited to apply for this course by sending a one-page motivation letter until 14.9.16 to Florian Rittiner (frittiner@ethz.ch). Additionally please enroll via mystudies. Places will be assigned after the first lecture on the basis of your motivation letter and commitment for the class. | W | 5 credits | 5G | A. Cabello Llamas, F. Rittiner, S. Brusoni, C. Hölscher, M. Meboldt | |
Abstract | The goal of this course is to engage students in a multidisciplinary collaboration to tackle real world problems. Following a design thinking approach, students will work in teams to solve a set of design challenges that are organized as a one-week, a three-week, and a final six-week project in collaboration with an external project partner. Information and application: www.sparklabs.ch/ethz | |||||
Objective | During the course, students will learn about different design thinking methods and tools. This will enable them to: - Generate deep insights through the systematic observation and interaction of key stakeholders. - Engage in collaborative ideation with a multidisciplinary (student) team. - Rapidly prototype and iteratively test ideas and concepts by using various materials and techniques. | |||||
Content | The purpose of this course is to equip the students with methods and tools to tackle a broad range of problems. Following a Design Thinking approach, the students will learn how to observe and interact with key stakeholders in order to develop an in-depth understanding of what is truly important and emotionally meaningful to the people at the center of a problem. Based on these insights, the students ideate on possible solutions and immediately validated them through quick iterations of prototyping and testing using different tools and materials. The students will work in multidisciplinary teams on a set of challenges that are organized as a one-week, a three-week, and a final six-week project with an external project partner. In this course, the students will learn about the different Design Thinking methods and tools that are needed to generate deep insights, to engage in collaborative ideation, rapid prototyping and iterative testing. Design Thinking is a deeply human process that taps into the creative abilities we all have, but that get often overlooked by more conventional problem solving practices. It relies on our ability to be intuitive, to recognize patterns, to construct ideas that are emotionally meaningful as well as functional, and to express ourselves through means beyond words or symbols. Design Thinking provides an integrated way by incorporating tools, processes and techniques from design, engineering, the humanities and social sciences to identify, define and address diverse challenges. This integration leads to a highly productive collaboration between different disciplines. For more information and the application visit: http://sparklabs.ch/ethz | |||||
Prerequisites / Notice | Class attendance and active participation is crucial as much of the learning occurs through the work in teams during class. Therefore, attendance is obligatory for every session. Please also note that the group work outside class is an essential element of this course, so that students must expect an above-average workload. |
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